TWINSCAN NXT:2050i
A detailed look at the TWINSCAN NXT:2050i lithography tool
1. What is the light source used in the TWINSCAN NXT:2050i lithography tool?
X-Ray
ArF
UV
DUV
2. What is the resolution of the TWINSCAN NXT:2050i lithography tool?
40 nm (C-quad)
38 nm (dipole)
25 nm
30 nm
3. What type of projection optics is featured by the TWINSCAN NXT:2050i lithography tool?
Catadioptric projection lens
Parallel ILIAS (PARIS) sensor
ORION alignment sensor
Level sensor (UVLS-2)
4. What is the wafer production rate of the TWINSCAN NXT:2050i lithography tool?
200 wafers per hour
250 wafers per hour
295 wafers per hour
350 wafers per hour
5. Which feature of TWINSCAN NXT:2050i system allows for more accurate alignment and reticle heating correction?
Optics elements with manipulators
Redesigned wafer stage
Immersion hood that reduces water loss
Parallel ILIAS (PARIS) sensor
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